Chair: Charles Woychik, Nhanced Semiconductors Co-Chair:
10:30am-11:00am >>Cu Conductive Paste as Via Filling Materials for Through Glass Via (TGV) Yoshinori Ejiri, Resonac Co., Ltd. Co-Authors: Masumi Sakamoto, Chiaki Shimizu, Naoyuki Kikuchi, Futoshi Oikawa, Masayoshi Nishimoto, Seiji Kai, Hiroshi Uragami, Resonac Co., Ltd.
11:00am-11:30am >>Advancing Bonding Techniques for Electronic Interconnects: Eco-Friendly Cu Nanoparticles and Cu-SAC Hybrid Paste Albert Wu, National Central University Co-Authors: Hung Wang, Ping-Hsuan Chen, National Central University; Watson Tseng, Chang-Meng Wang, Shenmao Technology Inc.
11:30am-12:00pm >>Non-toxic Stabilization for Mixed Reaction Gold Sandra Nelle, Atotech Deutschland GmbH & Co. KG Co-Authors: Britta Schafsteller, Robert Spreemann, Dirk Tews, Atotech Deutschland GmbH & Co.KG
Thursday October 24, 2024 10:30am - 12:00pm CDT
Room 45